Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

Publisher:
Standards Australia

Document status:

Active

Format:

Electronic (PDF)

Delivery time:

10 minutes

Delivery time (for Russian version):

200 business days

SKU:

Adopts ISO 14237:2000 to specify a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon, using uniformly doped materials calibrated by a certified reference material implanted with boron.

Edition :	1st
File Size :	1 file , 690 KB
ISBN(s) :	0733777929
Note :	This product is unavailable in Ukraine, Russia, Belarus
Number of Pages :	22
Product Code(s) :	10103377, 10103364, 10103400
Published :	10/20/2006

AS ISO 14237-2006 PDF

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

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