Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

Publisher:
Standards Australia

Document status:

Active

Format:

Electronic (PDF)

Delivery time:

10 minutes

Delivery time (for Russian version):

200 business days

SKU:

Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.

Edition :	1st
File Size :	1 file , 770 KB
ISBN(s) :	0733777872
Note :	This product is unavailable in Ukraine, Russia, Belarus
Number of Pages :	10
Product Code(s) :	10090409, 10090404, 10090419
Published :	10/20/2006

AS ISO 17560-2006 PDF

Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

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