ASTM F1513-99(2011) PDF

ASTM F1513-99(2011) PDF

Name:
ASTM F1513-99(2011) PDF

Published Date:
06/01/2011

Status:
[ Withdrawn ]

Description:

Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications (Withdrawn 2020)

Publisher:
ASTM International

Document status:
Active

Format:
Electronic (PDF)

Delivery time:
10 minutes

Delivery time (for Russian version):
200 business days

SKU:

Choose Document Language:
$15.6
Need Help?

1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets).

1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging.

1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.


File Size : 1 file , 58 KB
Note : This product is unavailable in Russia, Ukraine, Belarus
Number of Pages : 2
Published : 06/01/2011

History

ASTM F1513-99(2011)
Published Date: 06/01/2011
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications (Withdrawn 2020)
$15.6
ASTM F1513-99(2003)
Published Date: 01/01/2003
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
$15
ASTM F1513-99
Published Date: 12/10/1999
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
$15

Related products

ASTM F1894-98(2011)
Published Date: 06/01/2011
Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)
$18
ASTM F996-11(2018)
Published Date: 03/01/2018
Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift Into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current-Voltage Characteristics (Withdrawn 2023)
$22.5
ASTM F1761-00(2011)
Published Date: 06/01/2011
Standard Test Method for Pass Through Flux of Circular Magnetic Sputtering Targets (Withdrawn 2020)
$20.1
ASTM F106-24
Published Date: 04/01/2024
Standard Specification for Brazing Filler Metals for Electron Devices
$18.9

Best-Selling Products