This powerpoint presentation begins by providing a brief overview of ultraviolet- (UV)- C disinfection. Research objectives include: compare the DNA damage and repair of E. coli after UV-C and UV/TiO<sub>2</sub> disinfection; and, explore the possible mechanism of the reactivation repression effect by UV/TiO<sub>2</sub> disinfection. Methodology included: microorganism - Strain: E. coli K12 JM109; UV-C and UV/TiO<sub>2</sub> irradiation; and, Endonuclease Sensitive Site Assay (ESS Assay). Presentation summary indicates that: E. coli DNA dimer repair is obstructed by UV/TiO<sub>2</sub> irradiation,
probably resulting in subsequent photoreactivation repression; the direct damage to the photoreactivating enzyme may not be
the main reason to the repression of dimer repair, it requires
further investigation; and, the photoreactivation can be partially attributed to the increase
of oxidative stress in bacteria by UV/TiO<sub>2</sub> and UV/H<sub>2</sub>O<sub>2</sub>
irradiation. Includes tables, figures.
| Edition : | Vol. - No. |
| Number of Pages : | 24 |
| Published : | 11/01/2009 |
