Name:
CEI EN 62047-9 PDF
Published Date:
07/01/2012
Status:
[ Active ]
Publisher:
Comitato Elettrotecnico Italiano
This standard describes bonding strength measurement method of wafer to wafer bonding, type of bonding process such as silicon to silicon fusion bonding, silicon to glass anodic bonding, etc., and applicable structure size during MEMS processing/assembly. The applicable wafer thickness is in the range of 10 μm to several millimeters.
| Edition : | 12 |
| File Size : | 1 file , 1.2 MB |
| Number of Pages : | 32 |
| Published : | 07/01/2012 |