Surface chemical analysis - Depth profiling - Measurement of sputtered depth

Publisher:
International Organization for Standardization (Technical Report)

Document status:

Active

Format:

Electronic (PDF)

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10 minutes

Delivery time (for Russian version):

200 business days

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ISO/TR 15969:2021 provides guidelines for measuring the sputtered depth in sputtered depth profiling. The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.

Edition :	2nd
File Size :	1 file , 1.7 MB
Note :	This product is unavailable in Ukraine, Russia, Belarus
Number of Pages :	20
Published :	03/01/2021

ISO/TR 15969:2021 PDF

Surface chemical analysis - Depth profiling - Measurement of sputtered depth

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