BS ISO 21859:2019 PDF

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

Cross References:
ISO 4287
ISO 18452
ISO 3274


All current amendments available at time of purchase are included with the purchase of this document.

File Size :	1 file , 490 KB
ISBN(s) :	9780580962011
Note :	This product is unavailable in Russia, Ukraine, Belarus
Number of Pages :	10
Product Code(s) :	30350531, 30350531, 30350531
Published :	06/19/2019
Same As :	BS ISO 21859:2019