BS ISO 22415:2019 PDF

This document specifies a method for measuring and reporting argon cluster sputtering yield volumes of a specific organic material. The method requires one or more test samples of the specified material as a thin, uniform film of known thickness between 50 and 1 000 nanometres on a flat substrate which has a different chemical composition to the specified material. This document is applicable to test samples in which the specified material layer has homogeneous composition in depth and is not applicable if the depth distribution of compounds in the specified material is inhomogeneous. This document is applicable to instruments in which the sputtering ion beam irradiates the sample using a raster to ensure a constant ion dose over the analysis area.

Cross References:
ISO 18115-1:2013
ISO/TR 15969
ASTM E 1438


All current amendments available at time of purchase are included with the purchase of this document.

File Size :	1 file , 2.3 MB
ISBN(s) :	9780580989087
Note :	This product is unavailable in Russia, Ukraine, Belarus
Number of Pages :	38
Product Code(s) :	30362139, 30362139, 30362139
Published :	05/14/2019
Same As :	BS ISO 22415:2019