Name:
ISO 12406:2010 PDF
Published Date:
11/15/2010
Status:
Active
ISO 12406:2010 specifies a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of arsenic in silicon, and using stylus profilometry or optical interferometry for depth calibration. This method is applicable to single-crystal, poly-crystal or amorphous silicon specimens with arsenic atomic concentrations between 1 x 1016 atoms/cm3 and 2,5 x 1021 atoms/cm3, and to crater depths of 50 nm or deeper.
| File Size : | 1 file , 400 KB |
| Note : | This product is unavailable in Ukraine, Russia, Belarus |
| Published : | 11/15/2010 |
| Same As : | ISO 12406:2010 |
