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ISO 17331:2004 PDF

ISO 17331:2004 PDF

Name:
ISO 17331:2004 PDF

Published Date:
05/15/2004

Status:
Active

Description:

Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

Publisher:
International Organization for Standardization

Document status:
Active
Format:
Electronic (PDF)
Delivery time:
10 minutes
Delivery time (for Russian version):
200 business days
SKU:
Choose Document Language:
$37.2
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ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.

It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.


File Size : 1 file , 250 KB
Note : This product is unavailable in Ukraine, Russia, Belarus
Number of Pages : 18
Published : 05/15/2004
Same As : ISO 17331:2004

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