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ISO 21859:2019 PDF

ISO 21859:2019 PDF

Name:
ISO 21859:2019 PDF

Published Date:
07/01/2019

Status:
Active

Description:

Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

Publisher:
International Organization for Standardization

Document status:
Active
Format:
Electronic (PDF)
Delivery time:
10 minutes
Delivery time (for Russian version):
200 business days
SKU:
Choose Document Language:
$16.2
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ISO 21859:2019 specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.


Edition : 1st
File Size : 1 file , 1.1 MB
Note : This product is unavailable in Ukraine, Russia, Belarus
Number of Pages : 10
Published : 07/01/2019
Same As : ISO 21859:2019

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