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Extreme Ultraviolet Lithography PDF

Extreme Ultraviolet Lithography PDF

Name:
Extreme Ultraviolet Lithography PDF

Published Date:
01/01/2009

Status:
[ Active ]

Description:

Publisher:
McGraw-Hill Publishing Company

Document status:
Active
Format:
Electronic (PDF)
Delivery time:
10 minutes
Delivery time (for Czech version):
200 business days
SKU:
extreme-ultraviolet-lithography_2813107
Choose Document Language:
40.50 €
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ISBN: 9780071549189

Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.


Edition : 09
Published : 01/01/2009
isbn : 9780071549189

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