Cleanrooms are essential in the semiconductor industry, including the manufacture of optical fabs, where the environment must be highly controlled to prevent contamination that can impact the quality of the product. Airflow and thermal distribution are critical factors in cleanroom performance, as they can affect the distribution of particles and temperature uniformity, impacting product quality. However, designing and optimizing cleanroom performance can be a complex process, as there are many factors to consider, including air velocity, temperature, pressure, etc. This study aimed to optimize the performance of a cleanroom for optical fabs by improving airflow and thermal distribution. The study involved a combination of field measurements, computational fluid dynamics (CFD) simulations, and validation between both methods. Two different FFU layouts, Design 1 and Design 2, were compared, and it was found that Design 2 outperformed Design 1 in terms of airflow and thermal distribution. The statistical methods of the Taguchi method and ANOVA were used to analyze the data obtained from the nine experimental runs, where the inlet temperature ranged from 15 to 17°C (59 to 63°F), inlet air velocity ranged from 0.4 to 0.5 m/s (78 to 98 fpm), and heat flux ranged from 1500 to 2000 W/m2 (475 to 634 btu/h·ft2). The contribution of heat flux to the performance improvement was found to be 44%, followed by inlet air velocity at 35.21% and temperature at 20.26%. The results of this study can identify the most important parameters and help improve the design and operation of cleanrooms for optical fabs, leading to better product quality and manufacturing efficiency.
| File Size : | 1
file
, 4 MB |
| Note : | This product is unavailable in Russia, Belarus |
| Number of Pages : | 7 |
| Product Code(s) : | D-CH-24-C009 |
| Published : | 2024 |
