Gas-Phase Contamination Control for Semiconductor Clean Rooms PDF

Notes that the existence of airborne gas-phase contamination in semi-conductor wafer fabrication facilities is widely accepted and documented. The decision to use gas-phase contamination control equipment for a particular situation is quite involved and is typically owner-driven. Presents the application of gas-phase contamination control equipment from the design engineer's perspective, involving 1) determination of gas-phase contamination classification, 2) identification of the contaminants, 3) identification of the control methods and HVAC systems which require gas-phase filtration, 4) selection and specification of gas-phase contamination control equipment and systems, verification of gas-phase equipment performance and continuing performance verification.