THE SIMAN FACTORY SIMULATION SOFTWARE PROGRAM WAS USED TO MODEL A SEMICONDUCTOR PILOT LINE PHOTOLITHOGRAPHY BAY. EMPIRICAL DATA WAS COLLECTED FROM THE PILOT LINE UNDER NORMAL OPERATING CONDITIONS TO DEFINE THE MODEL INPUT CONDITIONS. FOR DIFFERENT LOT START RATES, THE MODEL HELPS TO UNDERSTAND THE CAPITALIZATION AND COMPLEMENTARY PERSONNEL STAFFING REQUIREMENTS OF A PHOTOBAY. THE SIMULATION WAS PERFORMED EFFICIENTLY USING A RESPONSE SURFACE EXPERIMENTAL DESIGN OF PROGRAM INPUTS. OUTPUT VALUES OF THE SIMULATION WERE ANALYZED FOR STATISTICAL SIGNIFICANCE OF MAIN EFFECTS AND INTERACTIONS. THE DATA WAS FIT TO A SECOND ORDER POLYNOMIAL SO OPTIMIZATION OF EQUIPMENT CAPACITY AND STAFFING LEVELS COULD BE QUANTIFIED.
| Number of Pages : | 10 |
| Published : | 06/01/1990 |
