Sequential application of multi-disinfectants in water treatment presents a
promising approach to inactivating pathogens and minimizing disinfection byproducts
(DBPs), while providing necessary residual protection. This study evaluated the
formation of trihalomethanes (THMs) and haloacetic acids (HAAs) during sequential
exposure of humic acid solutions to low-pressure UV irradiation and free chlorine or
monochloramine at two sequences and neutral pH. DBP formation potential (DBPFP)
were also measured. Pre-UV irradiation increased the DBP formation to some extent
during the following free chlorine or monochloramine exposures. The additional yields
of DBPs increased with increasing UV doses. When free chlorine or monochloramine
was added before UV exposure, higher DBP formation was observed. The contributions
of UV exposure to THM and HAA formation were demonstrated to be more significant
when disinfection byproduct formation potential (DBPFP) was measured. Includes 8 references, table, figures.
| Edition : | Vol. - No. |
| File Size : | 1
file
, 330 KB |
| Note : | This product is unavailable in Ukraine, Russia, Belarus |
| Number of Pages : | 8 |
| Published : | 06/17/2004 |
