DIN 50453-1 PDF

Published Date: 08/01/2023

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 1: Silicium monocrystals, gravimetric method

Published Date: 02/01/2023

Draft Document - Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 1: Silicium monocrystals, gravimetric method

Published Date: 10/01/1990

Testing of materials for semiconductor technology; determination of etch rates of etching mixtures; silicium monocrystals; gravimetric method

Published Date: 08/01/2023

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method

Published Date: 08/01/1999

Characterization of encapsulating compounds for electronic components used in semiconductor technology - Part 3: Determination of cationic impurities

Published Date: 04/01/2003

Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 1: Silver (Ag), gold (Au), calcium (Ca), copper (Cu), iron (Fe), potassium (K) and sodium (Na) in nitric acid by AAS

Published Date: 11/01/2014

Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Determination of 31 elements in high-purity nitric acid by ICP-MS

Published Date: 2019

Published Date: 2023