Name:
ISO 14706:2014 PDF
Published Date:
08/01/2014
Status:
Active
ISO 14706:2014 specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces. The method is applicable to the following: elements of atomic number from 16 (S) to 92 (U); contamination elements with atomic surface densities from 1 × 1010 atoms/cm2 to 1 × 1014 atoms/cm2; contamination elements with atomic surface densities from 5 × 108 atoms/cm2 to 5 × 1012 atoms/cm2 using a VPD (vapour-phase decomposition) specimen preparation method.
| File Size : | 1 file , 860 KB |
| Note : | This product is unavailable in Ukraine, Russia, Belarus |
| Number of Pages : | 32 |
| Published : | 08/01/2014 |
| Same As : | ISO 14706:2014 |
