ISO 16531:2013 PDF

ISO 16531:2013 PDF

Name:
ISO 16531:2013 PDF

Published Date:
06/01/2013

Status:
Active

Description:

Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

Publisher:
International Organization for Standardization

Document status:
Active

Format:
Electronic (PDF)

Delivery time:
10 minutes

Delivery time (for Russian version):
200 business days

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Choose Document Language:
$30.9
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ISO 16531:2013 specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.


File Size : 1 file , 1.2 MB
Note : This product is unavailable in Ukraine, Russia, Belarus
Published : 06/01/2013
Same As : ISO 16531:2013

History

ISO 16531:2020
Published Date: 10/01/2020
Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
$49.8
ISO 16531:2013
Published Date: 06/01/2013
Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
$30.9

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