Name:
ASTM F2113-01(2007) PDF

Published Date:
06/01/2007

Status:
Active

Description:

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

Publisher:
ASTM International

Document status:

Active

Format:

Electronic (PDF)

Delivery time:

10 minutes

Delivery time (for Russian version):

200 business days

SKU:

1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.

1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

File Size :	1 file , 60 KB
Note :	This product is unavailable in Russia, Ukraine, Belarus
Number of Pages :	2
Published :	06/01/2007

History

ASTM F2113-01(2011)

Published Date: 06/01/2011

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)

$15.6

ASTM F2113-01(2007)

Published Date: 06/01/2007

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

$15

ASTM F2113-01e1

Published Date: 06/10/2001

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

$15

ASTM F2113-01

Published Date: 06/10/2001

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

$15

Related products

ASTM F1238-95(2011)

Published Date: 06/01/2011

Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications (Withdrawn 2020)

$15.6

ASTM F487-13(2018)

Published Date: 03/01/2018

Standard Specification for Fine Aluminum-1 % Silicon Wire for Semiconductor Lead-Bonding (Withdrawn 2024)

$19.8

ASTM F657-92(1999)

Published Date: 01/01/1999

Standard Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning (Withdrawn 2003)

$17.4

ASTM F1682-02

Published Date: 01/10/2002

Standard Test Method for Determining Travel of a Membrane Switch (Withdrawn 2008)

$15

Best-Selling Products

CAN/CSA-IEC 31010:20

Published Date: 04/01/2020

Risk management - Risk assessment techniques (Adopted IEC 31010:2019, second edition, 2019-06)

$70.5

CAN/CSA-IEC 61000-4-15:12 (R2021)

Published Date: 06/01/2012

CAN/CSA-IEC 61000-4-15:12 - Electromagnetic compatibility (EMC) - Part 4-15: Testing and measurement techniques - Flickermeter - Functional and design specifications (Adopted IEC 61000-4-15:2010, edition 2.0, 2010-08)

$69.3

CAN/CSA-IEC 61000-4-18:14 (R2023)

Published Date: 10/01/2014

Electromagnetic compatibility (EMC) - Part 4-18: Testing and measurement techniques - Damped oscillatory wave immunity test (Adopted IEC 61000-4-18:2011, edition 1:2006 consolidated with amendment 1:2010)

$78

CAN/CSA-IEC 61000-4-2:12 (R2022)

Published Date: 06/30/2012

Electromagnetic Compatibility (EMC) - Part 4-2: Testing and Measurement Techniques - Electrostatic Discharge Immunity Test (Adopted CEI/IEC 61000-4-2:1995 + A1:1998, edition 1.1, 1999-05)

$84.9

CAN/CSA-IEC 61000-4-3:21

Published Date: 05/01/2021

Electromagnetic compatibility (EMC) - Part 4-3: Testing and measurement techniques - Radiated, radio-frequency, electromagnetic field immunity test (IEC 61000-4-3:2006+A1:2007+A2:2010, IDT)

$184.8

CAN/CSA-IEC 61000-4-30:16

Published Date: 08/05/2022

Amendment 1 to Electromagnetic compatibility (EMC) - Part 4-30: Testing and measurement techniques - Power quality measurement methods (Adopted IEC 61000-4-30:2015, third edition, 2015-02)

$3.3