Name:
ASTM F2113-01(2011) PDF

Published Date:
06/01/2011

Status:
[ Withdrawn ]

Description:

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)

Publisher:
ASTM International

Document status:

Active

Format:

Electronic (PDF)

Delivery time:

10 minutes

Delivery time (for Russian version):

200 business days

SKU:

1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.

1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.

File Size :	1 file , 60 KB
Note :	This product is unavailable in Russia, Ukraine, Belarus
Number of Pages :	2
Published :	06/01/2011

History

ASTM F2113-01(2011)

Published Date: 06/01/2011

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)

$15.6

ASTM F2113-01(2007)

Published Date: 06/01/2007

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

$15

ASTM F2113-01e1

Published Date: 06/10/2001

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

$15

ASTM F2113-01

Published Date: 06/10/2001

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

$15

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