ASTM F2113-01 PDF

ASTM F2113-01 PDF

Name:
ASTM F2113-01 PDF

Published Date:
06/10/2001

Status:
Active

Description:

Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications

Publisher:
ASTM International

Document status:
Active

Format:
Electronic (PDF)

Delivery time:
10 minutes

Delivery time (for Russian version):
200 business days

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Choose Document Language:
$15
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1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein.

1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.


File Size : 1 file , 16 KB
Note : This product is unavailable in Russia, Ukraine, Belarus
Number of Pages : 2
Published : 06/10/2001

History

ASTM F2113-01(2011)
Published Date: 06/01/2011
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)
$15.6
ASTM F2113-01(2007)
Published Date: 06/01/2007
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
$15
ASTM F2113-01e1
Published Date: 06/10/2001
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
$15
ASTM F2113-01
Published Date: 06/10/2001
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
$15

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