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ISO 14237:2000 PDF

ISO 14237:2000 PDF

Name:
ISO 14237:2000 PDF

Published Date:
02/01/2000

Status:
Active

Description:

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

Publisher:
International Organization for Standardization

Document status:
Active
Format:
Electronic (PDF)
Delivery time:
10 minutes
Delivery time (for Russian version):
200 business days
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Choose Document Language:
$31.2
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This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.


File Size : 1 file , 300 KB
Note : This product is unavailable in Ukraine, Russia, Belarus
Number of Pages : 22
Published : 02/01/2000

History

ISO 14237:2010
ISO 14237:2010
Published Date: 07/15/2010
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
$49.8
ISO 14237:2000
ISO 14237:2000
Published Date: 02/01/2000
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
$31.2

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